2Inisi 6H-N Silicon Carbide Substrate Sic Wafer Faila Faila Fa'aa'oa'i Palemia Vasega Mos Vasega
O uiga ia o le silicon carbide wafer:
· Igoa Oloa: SiC Substrate
· Fauga Hexagonal: Mea fa'aeletoroni tulaga ese.
· Maualuluga Electron Feʻaveaʻi: ~600 cm²/V·s.
· Mauaina vailaʻau: Tetee i le pala.
· Tete'e o le Radiation: E talafeagai mo si'osi'omaga faigata.
· Fa'asa'olotoga o le Aveta'avale maualalo: Lelei i le vevela maualuga.
· Malosi: Malosi mea tau masini.
· Optoelectronic Capability: Suʻesuʻeina lelei le malamalama UV.
Silicon carbide wafer e tele faʻaoga
SiC wafer Talosaga:
SiC (Silicon Carbide) substrates o loʻo faʻaaogaina i le tele o faʻatinoga maualuga ona o latou uiga faʻapitoa e pei o le maualuga o le vevela, malosi eletise maualuga, ma le lautele o fusi. O nisi nei o talosaga:
1.Power Electronics:
· MOSFET maualuga-volt
IGBTs
·Schottky diodes
· Fa'aliliuga malosi
2. Masini Maualuluga:
· RF (Radio Frequency) amplifiers
· Transistors microwave
· Melimita-galu
3. High-Suve Electronics:
· Sensors ma taamilosaga mo siosiomaga faigata
· Aerospace eletise
· Ta'avale fa'aeletonika (fa'ata'ita'iga, iunite fa'atonutonu afi)
4. Optoelectronics:
·Ultraviolet (UV) photodetectors
· Diodes moli (LED)
· Diodes laser
5. Faiga Fa'afouina Malosiaga:
· Inverters Solar
· Savili turbine liliu
· Ta'avale eletise
6. Alamanuia ma Puipuiga:
· Radar faiga
· Fesootaiga Satelite
· Mea fa'aaniukilia reactor
SiC wafer Customization
E mafai ona matou faʻavasegaina le tele o le substrate SiC e fetaui ma ou manaʻoga faʻapitoa. Matou te ofoina atu foi le 4H-Semi HPSI SiC wafer ma le tele o le 10x10mm poʻo le 5x5 mm.
O le tau e faʻamoemoeina e le mataupu, ma o faʻamatalaga faʻapipiʻi e mafai ona faʻapitoa i lou manaʻo.
Taimi tilivaina i totonu ole 2-4 vaiaso. Matou te talia totogi e ala i le T / T.
O loʻo i ai i la matou fale gaosi mea faʻapipiʻi gaosiga ma 'au faʻapitoa, lea e mafai ona faʻapipiʻiina faʻamatalaga eseese, mafiafia ma foliga o le SiC wafer e tusa ai ma manaoga faʻapitoa a tagata faʻatau.