150mm 200mm 6inch 8inch GaN i luga ole Silicon Epi-layer wafer Gallium nitride epitaxial wafer
Gaosi auala
O le fa'agasologa o le gaosiga e aofia ai le fa'atupuina o le GaN i luga o le safaira e fa'aaoga ai auala fa'apitoa e pei o le fa'aputuina o ausa vaila'au fa'a-organic (MOCVD) po'o le molecular beam epitaxy (MBE). O le faʻagasologa o le faʻapipiʻiina o loʻo faʻatinoina i lalo o tulaga faʻatonutonu e faʻamautinoa ai le maualuga o le tioata ma le ata tifaga.
6inch GaN-On-Sapphire talosaga: 6-inisi safaira substrate meataalo o loʻo faʻaaogaina lautele i fesoʻotaʻiga microwave, faʻaogaina o le radar, tekinolosi uaea ma optoelectronics.
O nisi o talosaga masani e aofia ai
1. Rf malosi fa'atele
2. Alamanuia moli LED
3. Mea faigaluega feso'ota'iga feso'ota'iga uaealesi
4. Masini faaeletonika i le siosiomaga vevela maualuga
5. Optoelectronic masini
Fa'amatalaga o oloa
- Tele: O le lautele o le mea'ai e 6 inisi (tusa ma le 150 mm).
- Tulaga lelei: O le pito i luga ua faʻalelei lelei e maua ai le faʻata sili ona lelei.
- Mafiafia: O le mafiafia o le GaN layer e mafai ona faʻatulagaina e tusa ai ma manaʻoga faʻapitoa.
- Fa'apipi'i: O lo'o fa'apipi'iina ma le fa'aeteete le mea'ai i mea fa'aanti-static e puipuia ai le fa'aleagaina i le taimi o felauaiga.
- Fa'atulagaina pito: O le mea'ai e iai pito fa'atulagaina fa'apitoa e faafaigofie ai le fa'aogaina ma le fa'agaioiga i le taimi o sauniuniga o masini.
- Isi ta'iala: Fa'apitoa fa'apitoa e pei o le manifinifi, resistivity ma le fa'atonuga o le doping e mafai ona fetu'una'i e tusa ai ma mana'oga o tagata fa'atau.
Faatasi ai ma a latou meafaitino sili atu ma faʻaoga eseese, 6-inisi sapphire substrate wafers o se filifiliga faʻalagolago mo le atinaʻeina o masini semiconductor maualuga-faʻatinoga i pisinisi eseese.
Alafua | 6” 1mm <111> p-ituaiga Si | 6” 1mm <111> p-ituaiga Si |
Epi MafiafiaAvg | ~5um | ~7um |
Epi ThickUnif | <2% | <2% |
punou | +/-45um | +/-45um |
Ta'e | <5mm | <5mm |
Tu'usa'o BV | >1000V | >1400V |
HEMT Al% | 25-35% | 25-35% |
HEMT MafiafiaAvg | 20-30nm | 20-30nm |
Insitu SiN Cap | 5-60nm | 5-60nm |
2DEG fa'atasi | ~1013cm-2 | ~1013cm-2 |
Fe'avea'i | ~2000cm2/Vs (<2%) | ~2000cm2/Vs (<2%) |
Rsh | <330ohm/sq (<2%) | <330ohm/sq (<2%) |