6 inisi GaN-On-Safaira

Fa'amatalaga Puupuu:

150mm 6inch GaN i luga ole Silicon/Sapphire/SiC Epi-layer wafer Gallium nitride epitaxial wafer

O le 6-inisi sapphire substrate wafer o se mea semiconductor sili ona lelei o loʻo iai i luga ole gallium nitride (GaN) o loʻo tupu i luga o se mea faʻapipiʻi safaira.O meafaitino e sili ona lelei fela'uaiga fa'aeletonika ma e lelei mo le gaosiga o masini semiconductor maualuga ma maualuga.


Fa'amatalaga Oloa

Faailoga o oloa

150mm 6inch GaN i luga ole Silicon/Sapphire/SiC Epi-layer wafer Gallium nitride epitaxial wafer

O le 6-inisi sapphire substrate wafer o se mea semiconductor sili ona lelei o loʻo iai i luga ole gallium nitride (GaN) o loʻo tupu i luga o se mea faʻapipiʻi safaira.O meafaitino e sili ona lelei fela'uaiga fa'aeletonika ma e lelei mo le gaosiga o masini semiconductor maualuga ma maualuga.

Metotia o le gaosiga: O le fa'agasologa o le gaosiga e aofia ai le fa'atupuina o gaN i luga o le safaira e fa'aogaina ai auala fa'apitoa e pei o le fa'aputuina o le ausa kemisi-organic (MOCVD) po'o le molecular beam epitaxy (MBE).O le faʻagasologa o le faʻapipiʻiina o loʻo faʻatinoina i lalo o tulaga faʻatonutonu e faʻamautinoa ai le maualuga o le tioata ma le ata tifaga.

6inch GaN-On-Sapphire talosaga: 6-inisi safaira substrate meataalo o loʻo faʻaaogaina lautele i fesoʻotaʻiga microwave, faʻaogaina o le radar, tekinolosi uaea ma optoelectronics.

O nisi o talosaga masani e aofia ai

1. Rf malosi fa'atele

2. Alamanuia moli LED

3. Mea faigaluega feso'ota'iga feso'ota'iga uaealesi

4. Masini faaeletonika i le siosiomaga vevela maualuga

5. Optoelectronic masini

Fa'amatalaga o oloa

- Tele: O le lautele o le mea'ai e 6 inisi (tusa ma le 150 mm).

- Tulaga lelei: O le pito i luga ua faʻalelei lelei e maua ai le faʻata sili ona lelei.

- Mafiafia: O le mafiafia o le GaN layer e mafai ona faʻatulagaina e tusa ai ma manaʻoga faʻapitoa.

- Fa'apipi'i: O lo'o fa'apipi'iina ma le fa'aeteete le mea'ai i mea fa'aanti-static e puipuia ai le fa'aleagaina i le taimi o felauaiga.

- Fa'atulagaina pito: O le mea'ai e iai pito fa'atulagaina fa'apitoa e faafaigofie ai le fa'aogaina ma le fa'agaioiga i le taimi o tapenaga o masini.

- Isi ta'iala: Fa'apitoa fa'apitoa e pei o le manifinifi, resistivity ma le fa'atonuga o le doping e mafai ona fetu'una'i e tusa ai ma mana'oga o tagata fa'atau.

Faatasi ai ma a latou meafaitino sili atu ma faʻaoga eseese, 6-inisi sapphire substrate wafers o se filifiliga faʻalagolago mo le atinaʻeina o masini semiconductor maualuga-faʻatinoga i pisinisi eseese.

Alafua

6” 1mm <111> p-ituaiga Si

6” 1mm <111> p-ituaiga Si

Epi MafiafiaAvg

~5um

~7um

Epi ThickUnif

<2%

<2%

punou

+/-45um

+/-45um

Ta'e

<5mm

<5mm

Tu'usa'o BV

>1000V

>1400V

HEMT Al%

25-35%

25-35%

HEMT MafiafiaAvg

20-30nm

20-30nm

Inisitu SiN Cap

5-60nm

5-60nm

2DEG fa'atasi

~1013cm-2

~1013cm-2

Fe'avea'i

~2000cm2/Vs (<2%)

~2000cm2/Vs (<2%)

Rsh

<330ohm/sq (<2%)

<330ohm/sq (<2%)

Auiliili Ata

6 inisi GaN-On-Safaira
6 inisi GaN-On-Safaira

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